Request A Quote
Our business is most valuable when it helps our customers. Please fill out the form with as much detail as possible so we can respond with the most helpful solution.
Difluoromethane is an important etching gas in the plasma etching process of the electronics industry.
Chemical Name | Difluoromethane |
Synonyms | Carbon difluoride, HFC-32, R32 |
CAS # | 75-10-5 |
ELINCS # (EU) | 200-839-4 |
Molecular Formula | CH2F2 |
Structure | CH2F2 |
Molecular Weight | 52.02 |
ODP(CFC-11 = 1) | 0 |
GWP100(CO2 = 1) | 675 |
Atmospheric Life Time (Years) | 5 |
TWA(8-hr, mg/m³) | 2.5 |
Chemical Name | Difluoromethane |
Boiling Point(℃) | -52 |
Melting Point(℃) | -136 |
Liquid Density(g/cm³,) | 1.1 |
Vapor Density (Air=1) | 3.82 |
Saturated Vapor Pressure(21.1℃, kPa) | 1518.92 |
Critical Temperature(℃) | 78.45 |
Critical Pressure(MPa) | 5.83 |
Critical Density (g/cm³) | 0.43 |
Solubility in water (g/l) | >1.68 |
Flash Point(℃) | Not applicable |
Flammability | Combustible |
Explosion Limit(%vol) | 13-33 |
Purity | 99.9% | 99.99% |
Order Amount | Packing Specification |
Sample | Contact For More Details |
Commercial | Contact For More Details |
ISO Tank | Contact For More Details |
Custom Packaging | Contact For More Details |
Our business is most valuable when it helps our customers. Please fill out the form with as much detail as possible so we can respond with the most helpful solution.