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Trifluoromethane is an important etching gas in the plasma etching process of the electronics industry.
Chemical Name | Trifluoromethane |
Synonyms | Fluoroform, Fluoryl, Freon 23, Arcton 1,
HFC-23, R-23 |
CAS # | 75-46-7 |
ELINCS # (EU) | 200-872-4 |
Molecular Formula | CHF3 |
Structure | CHF3 |
Molecular Weight | 70.01 |
ODP(CFC-11 = 1) | 0 |
GWP100(CO2 = 1) | 12400 |
Atmospheric Life Time (Years) | 270 |
TWA(8-hr, mg/m3) | 2.5 |
Chemical Name | Trifluoromethane |
Boiling Point(℃) | -82.1 |
Melting Point(℃) | -155.2 |
Liquid Density(-82.1℃, g/cm3) | 1.431 |
Vapor Density (Air=1) | 2.417 |
Saturated Vapor Pressure(@20℃, MPa) | 4.38 |
Critical Temperature(℃) | 25.7 |
Critical Pressure(MPa) | 4.816 |
Critical Density (mol/L) | 7.52 |
Solubility in Water(@20℃, g/L) | 1 |
Flash Point(℃) | Not applicable (non-flammable) |
Flammability | Not applicable (non-flammable) |
Explosion Limit(%vol) | Not applicable (non-flammable) |
Order Amount | Packing Specification |
Sample | Contact For More Details |
Commercial | Contact For More Details |
ISO Tank | Contact For More Details |
Custom Packaging | Contact For More Details |
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